EFFECT OF OXIDATION-INDUCED POSITIVE CHARGES ON THE KINETICS OF SILICON OXIDATION

被引:35
作者
HAMASAKI, M
机构
关键词
D O I
10.1016/0038-1101(82)90160-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:479 / 486
页数:8
相关论文
共 18 条
[1]   SYMMETRY OF INTERFACE CHARGE DISTRIBUTION IN THERMALLY OXIDIZED SILICON [J].
ABOWITZ, G ;
ARNOLD, E ;
LADELL, J .
PHYSICAL REVIEW LETTERS, 1967, 18 (14) :543-+
[2]   THEORY OF THE OXIDATION OF METALS [J].
CABRERA, N ;
MOTT, NF .
REPORTS ON PROGRESS IN PHYSICS, 1948, 12 :163-184
[3]   GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J].
DEAL, BE ;
GROVE, AS .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) :3770-&
[4]   CHARACTERISTICS OF SURFACE-STATE CHARGE (QSS) OF THERMALLY OXIDIZED SILICON [J].
DEAL, BE ;
SKLAR, M ;
GROVE, AS ;
SNOW, EH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (03) :266-+
[5]  
DEAL BE, 1974, ELECTROCHEM SOC, V121, pC198
[6]  
FOWKES FM, 1980, SPR EL SOC M
[7]  
HAMASAKI M, 1982, SOLID ST ELECTRON, V25, P201
[8]  
HAYAFUJI Y, COMMUNICATION
[9]   EFFECT OF AN ELECTRIC FIELD ON SILICON OXIDATION [J].
JORGENSEN .
JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) :874-&
[10]  
KAMIGAKI Y, 1977, J APPL PHYS, V48, P2981