IMPURITY CONCENTRATION BROADENING OF ACCEPTOR LINES IN INDIUM-DOPED SILICON

被引:2
作者
BHATIA, KL
机构
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 1971年 / 46卷 / 02期
关键词
D O I
10.1002/pssb.2220460230
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:723 / &
相关论文
共 16 条
[1]  
BALTENSPERGER W, 1953, PHILOS MAG, V44, P1355
[2]  
BEBB BH, 1967, J PHYS CHEM SOLIDS, V28, P2087
[3]  
BEBB BH, 1969, SOLID STATE COMMUN, V7, P1
[4]  
BEBB BH, 1969, 3 INT C PHOT
[5]   TEMPERATURE DEPENDENCE OF IMPURITY ABSORPTION LINES IN SI (INDIUM) [J].
BHATIA, KL .
PHYSICS LETTERS A, 1971, A 34 (01) :14-&
[7]  
BLAKEMORE JS, 1962, SEMICONDUCTOR STATIS
[8]   INFRARED ABSORPTION LINES IN BORON-DOPED SILICON [J].
COLBOW, K .
CANADIAN JOURNAL OF PHYSICS, 1963, 41 (11) :1801-&
[9]   RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].
IRVIN, JC .
BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02) :387-+
[10]   SHALLOW IMPURITY STATES IN SILICON AND GERMANIUM [J].
KOHN, W .
SOLID STATE PHYSICS-ADVANCES IN RESEARCH AND APPLICATIONS, 1957, 5 :257-320