EFFECT OF H-2 PLASMA-ETCHING DURING GLOW-DISCHARGE DEPOSITION OF AMORPHOUS-CARBON FILMS

被引：11

作者：

NISHIKAWA, S

KAKINUMA, H

FUKUDA, H

WATANABE, T

NIHEI, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 04期

关键词：

D O I：

10.1143/JJAP.25.511

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：511 / 514

页数：4

共 8 条

[1] HYDROGEN CHEMISORPTION ON A-SI-H [J].

CLEMENS, HJ .

SOLID STATE COMMUNICATIONS, 1984, 51 (07) :483-486

[2] HARD CARBON COATINGS WITH LOW OPTICAL-ABSORPTION [J].

DISCHLER, B ;

BUBENZER, A ;

KOIDL, P .

APPLIED PHYSICS LETTERS, 1983, 42 (08) :636-638

[3] HYDROGEN CONTENT IN A-SIC-H FILMS PREPARED BY PLASMA DECOMPOSITION OF SILANE AND METHANE OR ETHYLENE [J].

FUJIMOTO, F ;

OOTUKA, A ;

KOMAKI, K ;

IWATA, Y ;

YAMANE, I ;

YAMASHITA, H ;

HASHIMOTO, Y ;

TAWADA, Y ;

NISHIMURA, K ;

OKAMOTO, H ;

HAMAKAWA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1984, 23 (07) :810-814

[4] GROWTH AND CHARACTERIZATION OF AMORPHOUS HYDROGENATED SILICON [J].

HIROSE, M .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1982, 21 (01) :275-281

[5] KINETICS OF PLASMA DEPOSITION OF A-SI-H FILMS [J].

HOTTA, S ;

OKAMOTO, H ;

HAMAKAWA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (09) :L562-L564

[6] REACTIONS OF ATOMIC-HYDROGEN IN THE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON BY GLOW-DISCHARGE AND REACTIVE SPUTTERING [J].

KAMPAS, FJ .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) :6408-6412

[7] MASS-SPECTROMETRY OF A SILANE GLOW-DISCHARGE DURING PLASMA DEPOSITION OF A-SI-H FILMS [J].

TURBAN, G ;

CATHERINE, Y ;

GROLLEAU, B .

THIN SOLID FILMS, 1980, 67 (02) :309-320

[8] PHOTO-LUMINESCENCE OF HYDROGENATED AMORPHOUS-CARBON FILMS [J].

WATANABE, I ;

HASEGAWA, S ;

KURATA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (06) :856-859

← 1 →