VOIDS IN THIN AS-DEPOSITED GOLD-FILMS PREPARED BY VAPOR-DEPOSITION

被引：57

作者：

LLOYD, JR ^{[1
]}

NAKAHARA, S ^{[1
]}

机构：

[1] STEVENS INST TECHNOL,DEPT MAT & MET ENGN,HOBOKEN,NJ 07030

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1977年 / 14卷 / 01期

关键词：

D O I：

10.1116/1.569172

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：655 / 659

页数：5

共 14 条

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[2] NUCLEATION AND INITIAL-GROWTH BEHAVIOR OF THIN-FILM DEPOSITS
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[3] ROLE OF CONTAMINANTS IN EPITAXIAL GROWTH OF GOLD ON SODIUM CHLORIDE
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[J]. PHILOSOPHICAL MAGAZINE, 1965, 12 (120): : 1143 - &
[4] THIN-FILM METALLIZATION OF OXIDES IN MICROELECTRONICS
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[J]. THIN SOLID FILMS, 1973, 18 (02) : 173 - 186
[5] MUZUKA T, 1967, SURF SCI, V8, P445
[6] NAKAHARA S, 1975, 33RD ANN P EMSA LAS, P212
[7] NAKAHARA S, 1975, PROPERTIES ELECTRODE, pCH3
[8] NUCLEATION AND GROWTH OF THIN FILMS AS OBSERVED IN ELECTRON MICROSCOPE
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STOWELL, MJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1966, 3 (03): : 156 - &
[9] OXIDE STRUCTURE IN EVAPORATED ALUMINUM FILMS
PETTIT, RB
SILCOX, J
[J]. JOURNAL OF APPLIED PHYSICS, 1974, 45 (07) : 2858 - 2866
[10] ROBINSON VNE, 1970, THIN SOLID FILMS, V5, P313