SUB-100-NM X-RAY MASK TECHNOLOGY USING FOCUSED-ION-BEAM LITHOGRAPHY

被引：18

作者：

CHU, W

YEN, A

ISMAIL, K

SHEPARD, MI

LEZEC, HJ

MUSIL, CR

MELNGAILIS, J

KU, YC

CARTER, JM

SMITH, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584493

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1583 / 1585

页数：3

共 19 条

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