W/WSI GATE SELF-ALIGNED HIFETS (HETEROINTERFACE FETS) USING AN ALINAS/GAINAS HETEROSTRUCTURE GROWN BY MOCVD

被引:7
作者
KAMADA, M
ISHIKAWA, H
KANEKO, K
WATANABE, N
机构
[1] Sony Corp Research Cent, Yokohama, Jpn, Sony Corp Research Cent, Yokohama, Jpn
关键词
D O I
10.1049/el:19880181
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
7
引用
收藏
页码:271 / 272
页数:2
相关论文
共 7 条
[1]  
Cirillo N. C. Jr., 1985, International Electron Devices Meeting. Technical Digest (Cat. No. 85CH2252-5), P317
[2]   INGAAS/INALAS HETEROSTRUCTURE DIODES FOR APPLICATION TO HIGH-SPEED SEMICONDUCTOR-GATED FETS [J].
FEUER, MD ;
CHANG, TY ;
SHUNK, SC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (11) :1640-1643
[3]   HIGH-TRANSCONDUCTANCE ALLNAS/GAINAS HIFETS GROWN BY MOCVD [J].
KAMADA, M ;
KOBAYASHI, T ;
ISHIKAWA, H ;
MORI, Y ;
KANEKO, K ;
KOJIMA, C .
ELECTRONICS LETTERS, 1987, 23 (06) :297-298
[4]   OHMIC CONTACTS ON SELECTIVELY DOPED ALINAS/GAINAS HETEROSTRUCTURES USING NI, AUGE AND AU [J].
KAMADA, M ;
ISHIKAWA, H ;
MORI, Y ;
KOJIMA, C .
SOLID-STATE ELECTRONICS, 1987, 30 (12) :1345-1349
[5]  
KAMADA M, 1987, I PHYS C SER, V83, P575
[6]   N+-GAAS UNDOPED GAALAS UNDOPED GAAS FIELD-EFFECT TRANSISTOR [J].
MATSUMOTO, K ;
OGURA, M ;
WADA, T ;
HASHIZUME, N ;
YAO, T ;
HAYASHI, Y .
ELECTRONICS LETTERS, 1984, 20 (11) :462-463
[7]   A GAAS GATE HETEROJUNCTION FET [J].
SOLOMON, PM ;
KNOEDLER, CM ;
WRIGHT, SL .
IEEE ELECTRON DEVICE LETTERS, 1984, 5 (09) :379-381