LASOS - LASER ANNEALED SILICON ON SAPPHIRE

被引:15
作者
YARON, G
HESS, LD
机构
[1] HUGHES RES LABS,MALIBU,CA 90265
[2] HUGHES AIRCRAFT CO,NEWPORT RES CTR,NEWPORT BEACH,CA
关键词
D O I
10.1109/T-ED.1980.19901
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:573 / 578
页数:6
相关论文
共 26 条
[1]   THIN-FILM SILICON - PREPATATION, PROPERTIES, AND DEVICE APPLICATIONS [J].
ALLISON, JF ;
DUMIN, DJ ;
HEIMAN, FP ;
MUELLER, CW ;
ROBINSON, PH .
PROCEEDINGS OF THE IEEE, 1969, 57 (09) :1490-+
[2]   ARSENIC DIFFUSION IN SILICON MELTED BY HIGH-POWER NANOSECOND LASER PULSING [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
APPLIED PHYSICS LETTERS, 1978, 33 (02) :137-140
[3]   MELTING MODEL FOR PULSING-LASER ANNEALING OF IMPLANTED SEMICONDUCTORS [J].
BAERI, P ;
CAMPISANO, SU ;
FOTI, G ;
RIMINI, E .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (02) :788-797
[5]  
BEAM KE, 1978, IEEE T ELECTRON DEV, V25, P1185
[6]   OPTIMIZATION OF AL STEP COVERAGE THROUGH COMPUTER-SIMULATION AND SCANNING ELECTRON-MICROSCOPY [J].
BLECH, IA ;
FRASER, DB ;
HASZKO, SE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (01) :13-19
[7]   ELECTROMIGRATION AND CREVICE FORMATION IN THIN METALLIC FILMS [J].
BLECH, IA .
THIN SOLID FILMS, 1972, 13 (01) :117-&
[8]   EVAPORATED FILM PROFILES OVER STEPS IN SUBSTRATES [J].
BLECH, IA .
THIN SOLID FILMS, 1970, 6 (02) :113-&
[9]  
Bloembergen N., 1979, LASER SOLID INTERACT, P1, DOI DOI 10.1063/1.31659
[10]  
CRAWFORD RH, 1967, MOSFET CIRCUIT DESIG