TEMPERATURE-MEASUREMENTS OF POLYMER SUBSTRATES (PMMA) IN AN RF DISCHARGE

被引:8
作者
ROCHOTZKI, R
FRIEDRICH, M
机构
来源
IEE PROCEEDINGS-A-SCIENCE MEASUREMENT AND TECHNOLOGY | 1992年 / 139卷 / 02期
关键词
PLASMAS; DISCHARGES; ELECTRIC; TEMPERATURE;
D O I
10.1049/ip-a-3.1992.0012
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The influence of pressure and applied power on the temperature of polymer substrates (PMMA material) in an RF discharge is studied with the help of laser interferometry. The evaluation of the temperature curves shows that the heat flux from the plasma towards the substrate differs significantly from the applied power. The temperature distribution over the substrate thickness is simulated numerically using the method of finite differences.
引用
收藏
页码:61 / 64
页数:4
相关论文
共 10 条
[1]   TEMPERATURE-MEASUREMENTS OF GLASS SUBSTRATES DURING PLASMA-ETCHING [J].
BOND, RA ;
DZIOBA, S ;
NAGUIB, HM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :335-338
[2]   REACTIVE ION ETCHING OF POLYMER-FILMS [J].
DEMS, BC ;
RODRIGUEZ, F ;
SOLBRIG, CM ;
NAMASTE, YMN ;
OBENDORF, SK .
INTERNATIONAL POLYMER PROCESSING, 1989, 4 (03) :183-187
[3]   OXYGEN PLASMA-ETCHING OF THICK POLYMER LAYERS [J].
GOLDSTEIN, IS ;
KALK, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :743-747
[4]   OXIDATIVE REMOVAL OF PHOTORESIST BY OXYGEN FREON-116 DISCHARGE PRODUCTS [J].
HANNON, JJ ;
COOK, JM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (05) :1164-1169
[5]   INSITU SILICON-WAFER TEMPERATURE-MEASUREMENTS DURING RF ARGON-ION PLASMA-ETCHING VIA FLUOROPTIC THERMOMETRY [J].
HUSSLA, I ;
ENKE, K ;
GRUNWALD, H ;
LORENZ, G ;
STOLL, H .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1987, 20 (07) :889-896
[6]  
JURGENSEN CW, 1989, ACS SYM SER, V412, P210
[7]   A SIMPLE METHOD FOR MONITORING SURFACE TEMPERATURES IN PLASMA TREATMENTS [J].
MANORY, RR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (05) :2392-2394
[8]  
POULSEN RG, 1976, ETCHING, P111
[9]   SURFACE THERMOGRAPHY [J].
ULRICKSON, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03) :1805-1809
[10]   DETERMINATION OF THE POWER AND CURRENT DENSITIES IN ARGON AND OXYGEN PLASMAS BY INSITU TEMPERATURE-MEASUREMENTS [J].
VISSER, RJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1989, 7 (02) :189-194