INTERFACIAL REACTION OF MO-W ALLOYS WITH SILICON

被引：10

作者：

OLOWOLAFE, JO ^{[1
]}

COLGAN, EG ^{[1
]}

PALMSTROM, CJ ^{[1
]}

MAYER, JW ^{[1
]}

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

来源：

THIN SOLID FILMS | 1986年 / 138卷 / 02期

关键词：

D O I：

10.1016/0040-6090(86)90397-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：245 / 254

页数：10

相关论文

共 29 条

[1] [Anonymous], 1967, HDB LATTICE SPACINGS
[2] SOLID-STATE REACTIONS OF TA-W THIN-FILMS AND SI SINGLE-CRYSTALS
APPELBAUM, A
EIZENBERG, M
BRENER, R
[J]. VACUUM, 1983, 33 (04) : 227 - 230
[3] SILICIDES FORMATION FOR REFRACTORY-METAL ALLOYS (TA-V AND TI-V) ON SI
APPELBAUM, A
EIZENBERG, M
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (08) : 2341 - 2345
[4] PHASE-SEPARATION AND LAYER SEQUENCE REVERSAL DURING SILICIDE FORMATION WITH NI-CR ALLOYS AND NI-CR BILAYERS
APPELBAUM, A
EIZENBERG, M
BRENER, R
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (04) : 914 - 919
[5] TITANIUM-TUNGSTEN CONTACTS TO SI - THE EFFECTS OF ALLOYING ON SCHOTTKY CONTACT AND ON SILICIDE FORMATION
BABCOCK, SE
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) : 6898 - 6905
[6] FORMATION OF SILICIDES IN MO-W BILAYER FILMS ON SI SUBSTRATES - MARKER EXPERIMENT
BAGLIN, J
DEMPSEY, J
HAMMER, W
DHEURLE, F
PETERSSON, S
SERRANO, C
[J]. JOURNAL OF ELECTRONIC MATERIALS, 1979, 8 (05) : 641 - 661
[7] INTERFACE-MARKER TECHNIQUE APPLIED TO THE STUDY OF METAL SILICIDE GROWTH
BAGLIN, JEE
DHEURLE, FM
HAMMER, WN
PETERSSON, S
[J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 168 (1-3): : 491 - 497
[8] BORDERS JA, 1974, APPL ION BEAMS METAL, P179
[9] CHEN JR, 1983, INTERFACES CONTACTS, P251
[10] FORMATION OF SHALLOW SCHOTTKY CONTACTS TO SI USING PT-SI AND PD-SI ALLOY-FILMS
EIZENBERG, M
FOELL, H
TU, KN
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (02) : 861 - 868