THE USE OF VECTOR SCANNING FOR PRODUCING ARBITRARY SURFACE CONTOURS WITH A FOCUSED ION-BEAM

被引：15

作者：

CROW, G

PURETZ, J

ORLOFF, J

DEFREEZ, RK

ELLIOTT, RA

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.584179

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1605 / 1607

页数：3

共 9 条

[1] CW OPERATION OF WIDELY AND CONTINUOUSLY TUNABLE MICROMACHINED-COUPLED-CAVITY DIODE-LASERS
DEFREEZ, RK
PURETZ, J
ELLIOTT, RA
ORLOFF, J
SWANSON, LW
[J]. ELECTRONICS LETTERS, 1986, 22 (17) : 919 - 921
[2] INTEGRATED-CIRCUIT REPAIR USING FOCUSED ION-BEAM MILLING
HARRIOTT, LR
WAGNER, A
FRITZ, F
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 181 - 184
[3] MICROMACHINING OF INTEGRATED OPTICAL STRUCTURES
HARRIOTT, LR
SCOTTI, RE
CUMMINGS, KD
AMBROSE, AF
[J]. APPLIED PHYSICS LETTERS, 1986, 48 (25) : 1704 - 1706
[4] MICROMACHINING OF OPTICAL STRUCTURES WITH FOCUSED ION-BEAMS
HARRIOTT, LR
SCOTTI, RE
CUMMINGS, KD
AMBROSE, AF
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 207 - 210
[5] 300 MW OPERATION OF A SURFACE-EMITTING PHASE-LOCKED ARRAY OF DIODE-LASERS
PURETZ, J
DEFREEZ, RK
ELLIOTT, RA
ORLOFF, J
PAOLI, TL
[J]. ELECTRONICS LETTERS, 1987, 23 (03) : 130 - 131
[6] FOCUSED-ION-BEAM MICROMACHINED ALGAAS SEMICONDUCTOR-LASER MIRRORS
PURETZ, J
DEFREEZ, RK
ELLIOTT, RA
ORLOFF, J
[J]. ELECTRONICS LETTERS, 1986, 22 (13) : 700 - 702
[7] CHEMICALLY ENHANCED FOCUSED ION-BEAM ETCHING OF DEEP GROOVES AND LASER-MIRROR FACETS IN GAAS UNDER CL-2 GAS IRRADIATION USING A FINE NOZZLE
TAKADO, N
ASAKAWA, K
YUASA, T
SUGATA, S
MIYAUCHI, E
HASHIMOTO, H
ISHII, M
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (26) : 1891 - 1893
[8] WAGNER A, 1983, SOLID STATE TECHNOL, V26, P97
[9] CHARACTERISTICS OF SILICON REMOVAL BY FINE FOCUSED GALLIUM ION-BEAM
YAMAGUCHI, H
SHIMASE, A
HARAICHI, S
MIYAUCHI, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 71 - 74

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