MODEL OF SI-SIO2 INTERFACES BASED ON ARXPS MEASUREMENTS

被引：21

作者：

HALBRITTER, J

机构：

来源：

JOURNAL OF MATERIALS RESEARCH | 1988年 / 3卷 / 03期

关键词：

D O I：

10.1557/JMR.1988.0506

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：506 / 513

页数：8

共 52 条

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[9]

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[10]

CERVA H, COMMUNICATION

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