DEFECT PRODUCTION DURING THE FABRICATION OF SOI BY OXYGEN ION-IMPLANTATION

被引:2
作者
BARKLIE, RC [1 ]
ENNIS, TJ [1 ]
REESON, K [1 ]
HEMMENT, PLF [1 ]
机构
[1] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND
关键词
D O I
10.1016/0169-4332(89)90935-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
收藏
页码:400 / 407
页数:8
相关论文
共 23 条
[1]   ELECTRON-PARAMAGNETIC-RES OF DEFECTS IN SILICON-ON-INSULATOR STRUCTURES FORMED BY ION-IMPLANTATION .1. O+ IMPLANTATION [J].
BARKLIE, RC ;
HOBBS, A ;
HEMMENT, PLF ;
REESON, K .
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1986, 19 (32) :6417-6432
[2]   DEFECTS IN SIO2 IN BURIED-OXIDE STRUCTURES FORMED BY O+ IMPLANTATION [J].
BARKLIE, RC ;
ENNIS, TJ ;
HEMMENT, PLF ;
REESON, K .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 32 (1-4) :433-436
[3]   ELECTRON-PARAMAGNETIC RESONANCE OF LATTICE DAMAGE IN OXYGEN-IMPLANTED SILICON [J].
BROWER, KL ;
BEEZHOLD, W .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (08) :3499-&
[4]   ESR CENTERS, INTERFACE STATES, AND OXIDE FIXED CHARGE IN THERMALLY OXIDIZED SILICON WAFERS [J].
CAPLAN, PJ ;
POINDEXTER, EH ;
DEAL, BE ;
RAZOUK, RR .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (09) :5847-5854
[5]   PARAMAGNETIC CENTERS AT SI-SIO2 INTERFACES IN SILICON-ON-INSULATOR FILMS [J].
CARLOS, WE .
APPLIED PHYSICS LETTERS, 1987, 50 (20) :1450-1452
[6]   HIGH-QUALITY SI-ON-SIO2 FILMS BY LARGE DOSE OXYGEN IMPLANTATION AND LAMP ANNEALING [J].
CELLER, GK ;
HEMMENT, PLF ;
WEST, KW ;
GIBSON, JM .
APPLIED PHYSICS LETTERS, 1986, 48 (08) :532-534
[7]   ESR AND OPTICAL ABSORPTION STUDIES OF ION-IMPLANTED SILICON [J].
CROWDER, BL ;
TITLE, RS ;
BRODSKY, MH ;
PETTIT, GD .
APPLIED PHYSICS LETTERS, 1970, 16 (05) :205-&
[8]  
ENNIS TJ, 1988, IN PRESS 1987 P C PH
[9]   OXYGEN VACANCY MODEL FOR E'/1 CENTER IN SIO2 [J].
FEIGL, FJ ;
FOWLER, WB ;
YIP, KL .
SOLID STATE COMMUNICATIONS, 1974, 14 (03) :225-229
[10]   IRREVERSIBLE AND REVERSIBLE ANNEALING OF PARAMAGNETIC OXYGEN VACANCIES (E'1 CENTERS) IN OXYGEN-IMPLANTED AMORPHOUS SIO2 [J].
GOLANSKI, A ;
DEVINE, RAB ;
OBERLIN, JC .
JOURNAL OF APPLIED PHYSICS, 1984, 56 (06) :1572-1576