DEFECTS IN SIO2 IN BURIED-OXIDE STRUCTURES FORMED BY O+ IMPLANTATION

被引:4
作者
BARKLIE, RC [1 ]
ENNIS, TJ [1 ]
HEMMENT, PLF [1 ]
REESON, K [1 ]
机构
[1] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND
关键词
D O I
10.1016/0168-583X(88)90251-0
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:433 / 436
页数:4
相关论文
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