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MECHANISTIC STUDIES OF CHEMICAL VAPOR-DEPOSITION
被引:70
作者
:
JASINSKI, JM
论文数:
0
引用数:
0
h-index:
0
JASINSKI, JM
MEYERSON, BS
论文数:
0
引用数:
0
h-index:
0
MEYERSON, BS
SCOTT, BA
论文数:
0
引用数:
0
h-index:
0
SCOTT, BA
机构
:
来源
:
ANNUAL REVIEW OF PHYSICAL CHEMISTRY
|
1987年
/ 38卷
关键词
:
D O I
:
10.1146/annurev.physchem.38.1.109
中图分类号
:
O64 [物理化学(理论化学)、化学物理学];
学科分类号
:
070304 ;
081704 ;
摘要
:
引用
收藏
页码:109 / 140
页数:32
相关论文
共 203 条
[71]
SEMI-INSULATING POLYSILICON (SIPOS) DEPOSITION IN A LOW-PRESSURE CVD REACTOR .1. GROWTH-KINETICS
HITCHMAN, ML
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
HITCHMAN, ML
KANE, J
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
KANE, J
[J].
JOURNAL OF CRYSTAL GROWTH,
1981,
55
(03)
: 485
-
500
[72]
OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE
HO, P
论文数:
0
引用数:
0
h-index:
0
HO, P
BREILAND, WG
论文数:
0
引用数:
0
h-index:
0
BREILAND, WG
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(01)
: 51
-
53
[73]
A THEORETICAL-STUDY OF THE HEATS OF FORMATION OF SI2HN (N = 0-6) COMPOUNDS AND TRISILANE
HO, P
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
HO, P
COLTRIN, ME
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
COLTRIN, ME
BINKLEY, JS
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
BINKLEY, JS
MELIUS, CF
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
MELIUS, CF
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1986,
90
(15)
: 3399
-
3406
[74]
A THEORETICAL-STUDY OF THE HEATS OF FORMATION OF SIHN, SICIN, AND SIHNCLM COMPOUNDS
HO, P
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
HO, P
COLTRIN, ME
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
COLTRIN, ME
BINKLEY, JS
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
BINKLEY, JS
MELIUS, CF
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
MELIUS, CF
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1985,
89
(21)
: 4647
-
4654
[75]
OBSERVATION OF HSICL IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE
HO, P
论文数:
0
引用数:
0
h-index:
0
HO, P
BREILAND, WG
论文数:
0
引用数:
0
h-index:
0
BREILAND, WG
[J].
APPLIED PHYSICS LETTERS,
1983,
43
(01)
: 125
-
126
[76]
METASTABLE MOLECULAR PRECURSOR FOR THE DISSOCIATIVE ADSORPTION OF OXYGEN ON SI(111)
HOFER, U
论文数:
0
引用数:
0
h-index:
0
HOFER, U
MORGEN, P
论文数:
0
引用数:
0
h-index:
0
MORGEN, P
WURTH, W
论文数:
0
引用数:
0
h-index:
0
WURTH, W
UMBACH, E
论文数:
0
引用数:
0
h-index:
0
UMBACH, E
[J].
PHYSICAL REVIEW LETTERS,
1985,
55
(27)
: 2979
-
2982
[77]
PROBING THE TRANSITION LAYER AT THE SIO2-SI INTERFACE USING CORE LEVEL PHOTOEMISSION
HOLLINGER, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,NATL PHYS NUCL & PHYS PARTICLES,F-69622 VILLEURBANNE,FRANCE
HOLLINGER, G
HIMPSEL, FJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,NATL PHYS NUCL & PHYS PARTICLES,F-69622 VILLEURBANNE,FRANCE
HIMPSEL, FJ
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(01)
: 93
-
95
[78]
SI(111) SURFACE OXIDATION - O-1S CORE-LEVEL STUDY USING SYNCHROTRON RADIATION
HOLLINGER, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
HOLLINGER, G
MORAR, JF
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
MORAR, JF
HIMPSEL, FJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
HIMPSEL, FJ
HUGHES, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
HUGHES, G
JORDAN, JL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
JORDAN, JL
[J].
SURFACE SCIENCE,
1986,
168
(1-3)
: 609
-
616
[79]
HOULE FA, 1986, P ELECTROCHEM SOC, V86, P32
[80]
VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES
IBACH, H
论文数:
0
引用数:
0
h-index:
0
IBACH, H
BRUCHMANN, HD
论文数:
0
引用数:
0
h-index:
0
BRUCHMANN, HD
WAGNER, H
论文数:
0
引用数:
0
h-index:
0
WAGNER, H
[J].
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,
1982,
29
(03):
: 113
-
124
←
3
4
5
6
7
8
9
10
11
12
→
共 203 条
[71]
SEMI-INSULATING POLYSILICON (SIPOS) DEPOSITION IN A LOW-PRESSURE CVD REACTOR .1. GROWTH-KINETICS
HITCHMAN, ML
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
HITCHMAN, ML
KANE, J
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
RCA LABS LTD,CH-8048 ZURICH,SWITZERLAND
KANE, J
[J].
JOURNAL OF CRYSTAL GROWTH,
1981,
55
(03)
: 485
-
500
[72]
OBSERVATION OF SI2 IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE
HO, P
论文数:
0
引用数:
0
h-index:
0
HO, P
BREILAND, WG
论文数:
0
引用数:
0
h-index:
0
BREILAND, WG
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(01)
: 51
-
53
[73]
A THEORETICAL-STUDY OF THE HEATS OF FORMATION OF SI2HN (N = 0-6) COMPOUNDS AND TRISILANE
HO, P
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
HO, P
COLTRIN, ME
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
COLTRIN, ME
BINKLEY, JS
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
BINKLEY, JS
MELIUS, CF
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
MELIUS, CF
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1986,
90
(15)
: 3399
-
3406
[74]
A THEORETICAL-STUDY OF THE HEATS OF FORMATION OF SIHN, SICIN, AND SIHNCLM COMPOUNDS
HO, P
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
HO, P
COLTRIN, ME
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
COLTRIN, ME
BINKLEY, JS
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
BINKLEY, JS
MELIUS, CF
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
SANDIA NATL LABS, LIVERMORE, CA 94550 USA
MELIUS, CF
[J].
JOURNAL OF PHYSICAL CHEMISTRY,
1985,
89
(21)
: 4647
-
4654
[75]
OBSERVATION OF HSICL IN A CHEMICAL VAPOR-DEPOSITION REACTOR BY LASER-EXCITED FLUORESCENCE
HO, P
论文数:
0
引用数:
0
h-index:
0
HO, P
BREILAND, WG
论文数:
0
引用数:
0
h-index:
0
BREILAND, WG
[J].
APPLIED PHYSICS LETTERS,
1983,
43
(01)
: 125
-
126
[76]
METASTABLE MOLECULAR PRECURSOR FOR THE DISSOCIATIVE ADSORPTION OF OXYGEN ON SI(111)
HOFER, U
论文数:
0
引用数:
0
h-index:
0
HOFER, U
MORGEN, P
论文数:
0
引用数:
0
h-index:
0
MORGEN, P
WURTH, W
论文数:
0
引用数:
0
h-index:
0
WURTH, W
UMBACH, E
论文数:
0
引用数:
0
h-index:
0
UMBACH, E
[J].
PHYSICAL REVIEW LETTERS,
1985,
55
(27)
: 2979
-
2982
[77]
PROBING THE TRANSITION LAYER AT THE SIO2-SI INTERFACE USING CORE LEVEL PHOTOEMISSION
HOLLINGER, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,NATL PHYS NUCL & PHYS PARTICLES,F-69622 VILLEURBANNE,FRANCE
HOLLINGER, G
HIMPSEL, FJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,NATL PHYS NUCL & PHYS PARTICLES,F-69622 VILLEURBANNE,FRANCE
HIMPSEL, FJ
[J].
APPLIED PHYSICS LETTERS,
1984,
44
(01)
: 93
-
95
[78]
SI(111) SURFACE OXIDATION - O-1S CORE-LEVEL STUDY USING SYNCHROTRON RADIATION
HOLLINGER, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
HOLLINGER, G
MORAR, JF
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
MORAR, JF
HIMPSEL, FJ
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
HIMPSEL, FJ
HUGHES, G
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
HUGHES, G
JORDAN, JL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV LYON 1,INST PHYS NUCL,F-69622 VILLEURBANNE,FRANCE
JORDAN, JL
[J].
SURFACE SCIENCE,
1986,
168
(1-3)
: 609
-
616
[79]
HOULE FA, 1986, P ELECTROCHEM SOC, V86, P32
[80]
VIBRATIONAL STUDY OF THE INITIAL-STAGES OF THE OXIDATION OF SI(111) AND SI(100) SURFACES
IBACH, H
论文数:
0
引用数:
0
h-index:
0
IBACH, H
BRUCHMANN, HD
论文数:
0
引用数:
0
h-index:
0
BRUCHMANN, HD
WAGNER, H
论文数:
0
引用数:
0
h-index:
0
WAGNER, H
[J].
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,
1982,
29
(03):
: 113
-
124
←
3
4
5
6
7
8
9
10
11
12
→