SUBSTRATE CURRENT AT CRYOGENIC TEMPERATURES - MEASUREMENTS AND A TWO-DIMENSIONAL MODEL FOR CMOS TECHNOLOGY

被引:59
作者
HENNING, AK [1 ]
CHAN, NN [1 ]
WATT, JT [1 ]
PLUMMER, JD [1 ]
机构
[1] INTEL CORP, SANTA CLARA, CA 95051 USA
关键词
D O I
10.1109/T-ED.1987.22886
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:64 / 74
页数:11
相关论文
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