THE PHYSICS AND CHEMISTRY OF THE LITHOGRAPHIC PROCESS

被引：20

作者：

BOWDEN, MJ

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1981年 / 128卷 / 05期

关键词：

D O I：

10.1149/1.2127577

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C195 / C214

页数：20

共 67 条

[31]

HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337

[32]

HATZAKIS M, 1974, ELECTROCHEMISTRY SOC, P542

[33] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING - EXPERIMENT [J].

HAWRYLUK, RJ ;

SMITH, HI ;

SOARES, A ;

HAWRYLUK, AM .

JOURNAL OF APPLIED PHYSICS, 1975, 46 (06) :2528-2537

[34] ENERGY DISSIPATION IN A THIN POLYMER FILM BY ELECTRON-BEAM SCATTERING [J].

HAWRYLUK, RJ ;

HAWRYLUK, AM ;

SMITH, HI .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (06) :2551-2566

[35] ELECTRON-SCATTERING AND LINE-PROFILES IN NEGATIVE ELECTRON RESISTS [J].

HEIDENREICH, RD ;

BALLANTYNE, JP ;

THOMPSON, LF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1284-1288

[36] EMPIRICAL ELECTRON BACKSCATTER MODEL FOR THIN RESIST FILMS ON A SUBSTRATE [J].

HEIDENREICH, RD .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (04) :1418-1425

[37] FUNDAMENTAL ASPECTS OF ELECTRON-BEAM LITHOGRAPHY .1. DEPTH-DOSE RESPONSE OF POLYMERIC ELECTRON-BEAM RESISTS [J].

HEIDENREICH, RD ;

THOMPSON, LF ;

FEIT, ED ;

MELLIARS.CM .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (09) :4039-4047

[38]

HEIDENREICH RD, 1976, 4TH P PHOT C ELL, P94

[39] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J].

HERRIOTT, DR ;

COLLIER, RJ ;

ALLES, DS ;

STAFFORD, JW .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) :385-392

[40] ION-BEAM EXPOSURE OF RESIST MATERIALS [J].

KOMURO, M ;

ATODA, N ;

KAWAKATSU, H .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (03) :483-490

← 1 2 3 4 5 6 7 →