FABRICATION OF 80 NM-WIDE LINES IN FPM RESIST BY H+ BEAM EXPOSURE

被引:4
作者
MORIWAKI, K
ARITOME, H
NAMBA, S
KARAPIPERIS, L
机构
[1] CORNELL UNIV,PHYS,ITHACA,NY 14853
[2] CORNELL UNIV,NATL RES & RESOURCE FACIL SUBMICRON STRUCT,ITHACA,NY 14853
关键词
D O I
10.1143/JJAP.20.L881
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L881 / L884
页数:4
相关论文
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