MPI MS DETECTION OF SIF AND SIF2 RADICALS PRODUCED FROM THE REACTION OF F2 AND NF3 WITH SILICON

被引：26

作者：

DAGATA, JA

SQUIRE, DW

DULCEY, CS

HSU, DSY

LIN, MC

机构：

来源：

CHEMICAL PHYSICS LETTERS | 1987年 / 134卷 / 02期

关键词：

D O I：

10.1016/0009-2614(87)87112-9

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：151 / 155

页数：5

共 17 条

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[16] SILICON-FLUORINE CHEMISTRY .I. SILICON DIFLUORIDE AND PERFLUOROSILANES [J].

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[17] PLASMA-ASSISTED ETCHING MECHANISMS - THE IMPLICATIONS OF REACTION PROBABILITY AND HALOGEN COVERAGE [J].

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