POSITRON STUDY OF VACANCY-TYPE DEFECTS INDUCED BY HEAVY DOPING INTO MBE-GROWN GAAS

被引:16
作者
UEDONO, A [1 ]
TANIGAWA, S [1 ]
机构
[1] UNIV TSUKUBA,INST MAT SCI,TSUKUBA,IBARAKI 305,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1990年 / 29卷 / 02期
关键词
D O I
10.1143/JJAP.29.L346
中图分类号
O59 [应用物理学];
学科分类号
摘要
Variable-energy positron beam studies have been carried out on heavily Si-doped GaAs/AlGaAs/GaAs specimens prepared by molecular beam epitaxy. From the measurements of Doppler broadening profiles of the positron annihilation as a function of the incident positron energy, it was found that Ga vacancies with very high concentration are introduced in the GaAs layer by the heavy doping of Si. It was concluded that a Ga vacancy acts to reduce the concentration of free carriers. © 1990 IOP Publishing Ltd.
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页码:L346 / L348
页数:3
相关论文
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