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PROPERTIES OF SILICON AND ALUMINUM-OXIDE THIN-FILMS DEPOSITED BY DUAL ION-BEAM SPUTTERING
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
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SURFACE OPTICAL COATINGS BY ION ASSISTED DEPOSITION TECHNIQUES - STUDY OF UNIFORMITY
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HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ALUMINUM-OXIDE
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PARTICLE BOMBARDMENT EFFECTS ON THIN-FILM DEPOSITION - A REVIEW
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ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT
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PROPERTIES OF TIO2 AND SIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION
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