MICROSTRUCTURAL VARIATIONS IN ALUMINUM-OXIDE COATINGS DEPOSITED USING A DUAL BEAM ION SYSTEM

被引:4
作者
PANITZ, JKG
HILLS, CR
TALLANT, DR
机构
[1] Sandia National Laboratories, Albuquerque, New Mexico
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1990年 / 8卷 / 03期
关键词
D O I
10.1116/1.576873
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have sputter-deposited aluminum oxide coatings using a dual ion beam system with a mixture of argon plus 10% oxygen as the working gas. Ambient substrate temperatures and substrate temperatures of 360°C were maintained. The coatings were deposited at deposition rates between 7 and 10 nm/min, with and without concurrent ion bombardment from the second ion gun. Substantial variations in the microstructure and the amount of entrained gas in the coatings were observed. The coatings contain a mixture of varying amounts of γ-Al2O3and amorphous aluminum oxide. Relatively large, 0.5 μm islands of γ-Al2O3 crystallites surrounded by an amorphous matrix were observed in coatings deposited onto heated substrates with ion bombardment from the second ion gun during deposition. Coatings bombarded with a second ion beam during deposition contain more argon as determined by energy dispersive x-ray analysis. The Raman spectra exhibited by the coatings suggest a variation in chemical reactivity and/or porosity which depends on the deposition conditions. © 1990, American Vacuum Society. All rights reserved.
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页码:1313 / 1317
页数:5
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