APPLICATIONS OF NEGATIVE-ION BEAMS

被引：29

作者：

ISHIKAWA, J

机构：

[1] Department of Electronics, Kyoto University, Sakyo-ku, Kyoto, 606-01, Yoshida-honmachi

来源：

SURFACE & COATINGS TECHNOLOGY | 1994年 / 65卷 / 1-3期

关键词：

D O I：

10.1016/S0257-8972(94)80010-3

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The use of high current beams of negative ions for ion implantation and ion- beam deposition is described. A versatile r.f. sputter source which can deliver several milliamperes of negative ions such as boron, carbon, silicon and copper has been developed. It was observed that the surface charge-up of insulated targets implanted with negative ions saturated at only a few volts without breakdown. Pure carbon films of tetrahedrally bonded amorphous structure with high thermal conductivity comparable with that of diamond were prepared by the deposition of mass-separated carbon negative ions with precise control of the kinetic energy and the deposited species.

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收藏

页码：64 / 70

页数：7

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