OXIDATION ENHANCED DIFFUSION OF BORON AND PHOSPHORUS IN (100) SILICON

被引：96

作者：

TANIGUCHI, K

KUROSAWA, K

KASHIWAGI, M

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 10期

关键词：

D O I：

10.1149/1.2129384

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2243 / 2248

页数：6

共 19 条

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