MECHANISMS OF STRAINED ISLAND FORMATION IN MOLECULAR-BEAM EPITAXY OF INAS ON GAAS(100)

被引:74
作者
CHEN, P [1 ]
XIE, Q [1 ]
MADHUKAR, A [1 ]
CHEN, L [1 ]
KONKAR, A [1 ]
机构
[1] UNIV SO CALIF,DEPT PHYS,LOS ANGELES,CA 90089
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 04期
关键词
D O I
10.1116/1.587803
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Results of a systematic examination of InAs island formation on GaAs(100) as a function of deposition conditions and thickness are presented. A non-Arrhenius dependence of the island density on substrate temperature and a decrease in the island density with increasing As4 Pressure at lower substrate temperatures is observed, indicating that currently popular frameworks of compound semiconductor molecular-beam epitaxical growth and island formation mechanism(s) need to be enlarged. Plan-view transmission electron microscopy (TEM) and use of the behavior of Moire fringes provides the island size distribution and demarcation between coherent and incoherent islands. Photoluminescence (PL) behavior is shown to vary significantly with the growth conditions and to correlate to the attendant structural nature revealed by TEM. The issue of lateral quantum confinement (i.e., three-dimensional islands as quantum boxes) is shown to be subtle and complex, calling for caution in interpreting PL behavior. The results suggest that a regular array of ''quantum boxes'' made of coherently strained volumes of uniform size may be achieved via growth on prepatterned mesas.
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页码:2568 / 2573
页数:6
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