COMPOSITE THIN-FILM PRODUCTION BY ION-BOMBARDMENT

被引：12

作者：

CARR, W

SEIDL, M

TOMPA, GS

SOUZIS, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574783

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1250 / 1253

页数：4

共 10 条

[1]

BEHRISCH R, 1981, SPUTTERING PARTICLE, V1, P169

[2] SPUTTERING STUDIES WITH THE MONTE-CARLO PROGRAM TRIM.SP [J].

BIERSACK, JP ;

ECKSTEIN, W .

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 34 (02) :73-94

[3] UNIFIED EXPLANATION FOR SECONDARY ION YIELDS [J].

DELINE, VR ;

EVANS, CA ;

WILLIAMS, P .

APPLIED PHYSICS LETTERS, 1978, 33 (07) :578-580

[4] SURFACE POTENTIALS AND THEIR MEASUREMENT BY DIODE METHOD [J].

KNAPP, AG .

SURFACE SCIENCE, 1973, 34 (02) :289-316

[5] A MODEL FOR THE EVOLUTION OF IMPLANTED OXYGEN PROFILES IN SILICON [J].

MAYDELLONDRUSZ, EA ;

WILSON, IH .

THIN SOLID FILMS, 1984, 114 (04) :357-366

[6]

PRELEC K, 1984, PRODUCTION NEUTRALIZ

[7] ASSESSMENT OF PROFILE BROADENING DURING SPUTTERING [J].

REMMERIE, J ;

VANDERVORST, W ;

MAES, HE .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1986, 13 (1-3) :416-420

[8]

SEIDL M, 1982, P JOINT SEMINAR ATOM, P393

[9] FIELD-ELECTRON-MICROSCOPY STUDIES OF CESIUM LAYERS ON VARIOUS REFRACTORY METALS - WORK FUNCTION CHANGE [J].

SWANSON, LW ;

STRAYER, RW .

JOURNAL OF CHEMICAL PHYSICS, 1968, 48 (06) :2421-&

[10] CESIUM COVERAGE ON MOLYBDENUM DUE TO CESIUM ION-BOMBARDMENT [J].

TOMPA, GS ;

CARR, WE ;

SEIDL, M .

APPLIED PHYSICS LETTERS, 1986, 48 (16) :1048-1050

← 1 →