REACTION OF TITANIUM WITH GERMANIUM AND SILICON-GERMANIUM ALLOYS

被引:60
作者
THOMAS, O [1 ]
DELAGE, S [1 ]
DHEURLE, FM [1 ]
SCILLA, G [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
关键词
D O I
10.1063/1.101444
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:228 / 230
页数:3
相关论文
共 16 条
  • [1] APPLEBAUM A, 1985, J APPL PHYS, V57, P1322
  • [2] TITANIUM SILICIDE FORMATION - EFFECT OF OXYGEN DISTRIBUTION IN THE METAL-FILM
    BERTI, M
    DRIGO, AV
    COHEN, C
    SIEJKA, J
    BENTINI, GG
    NIPOTI, R
    GUERRI, S
    [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3558 - 3565
  • [3] METASTABLE PHASE FORMATION IN TITANIUM-SILICON THIN-FILMS
    BEYERS, R
    SINCLAIR, R
    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (12) : 5240 - 5245
  • [4] CHEMICAL AND STRUCTURAL ASPECTS OF REACTION AT THE TI SI INTERFACE
    BUTZ, R
    RUBLOFF, GW
    TAN, TY
    HO, PS
    [J]. PHYSICAL REVIEW B, 1984, 30 (10): : 5421 - 5429
  • [5] CHEMICAL BONDING AND REACTIONS AT TI/SI AND TI/OXYGEN/SI INTERFACES
    BUTZ, R
    RUBLOFF, GW
    HO, PS
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 771 - 775
  • [6] DHEURLE F, 1985, IBM RC11151 RES REP
  • [7] FORMATION OF THIN-FILMS OF COSI2 - NUCLEATION AND DIFFUSION MECHANISMS
    DHEURLE, FM
    PETERSSON, CS
    [J]. THIN SOLID FILMS, 1985, 128 (3-4) : 283 - 297
  • [8] NUCLEATION OF A NEW PHASE FROM THE INTERACTION OF 2 ADJACENT PHASES - SOME SILICIDES
    DHEURLE, FM
    [J]. JOURNAL OF MATERIALS RESEARCH, 1988, 3 (01) : 167 - 195
  • [9] DHEURLE FM, 1983, IBM RC10422 RES REP
  • [10] HOLLOWAY K, 1987, MATER RES SOC S P, V77, P357