METAL-SEMICONDUCTOR INTERFACIAL REACTIONS - NI-SI SYSTEM

被引：84

作者：

CHEUNG, NW

GRUNTHANER, FJ

GRUNTHANER, PJ

MAYER, JW

ULLRICH, BM

机构：

[1] CALTECH,JET PROP LAB,PASADENA,CA 91103

[2] CORNELL UNIV,ITHACA,NY 14853

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 03期

关键词：

D O I：

10.1116/1.570994

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：917 / 923

页数：7

共 20 条

[1]

BAGLIN J, 1980, THIN FILM INTERFACES

[2] NI ON SI(111) - REACTIVITY AND INTERFACE STRUCTURE [J].

CHEUNG, NW ;

CULBERTSON, RJ ;

FELDMAN, LC ;

SILVERMAN, PJ ;

WEST, KW ;

MAYER, JW .

PHYSICAL REVIEW LETTERS, 1980, 45 (02) :120-124

[3]

CHEUNG NW, 1980, THESIS CALIFORNIA I

[4]

CHEUNG NW, UNPUBLISHED

[5]

Chu WK., 1978, BACKSCATTERING SPECT

[6] USE OF THIN SI CRYSTALS IN BACKSCATTERING-CHANNELING STUDIES OF SI-SIO2 INTERFACE [J].

FELDMAN, LC ;

SILVERMAN, PJ ;

WILLIAMS, JS ;

JACKMAN, TE ;

STENSGAARD, I .

PHYSICAL REVIEW LETTERS, 1978, 41 (20) :1396-1399

[7] SILICIDE SCHOTTKY BARRIERS - ELEMENTAL DESCRIPTION [J].

FREEOUF, JL .

SOLID STATE COMMUNICATIONS, 1980, 33 (10) :1059-1061

[8] MICROSCOPIC COMPOUND FORMATION AT THE PD-SI(111) INTERFACE [J].

FREEOUF, JL ;

RUBLOFF, GW ;

HO, PS ;

KUAN, TS .

PHYSICAL REVIEW LETTERS, 1979, 43 (24) :1836-1839

[9] EXPERIMENTAL-OBSERVATIONS OF CHEMISTRY OF SIO2-SI INTERFACE [J].

GRUNTHANER, FJ ;

MASERJIAN, J .

IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1977, 24 (06) :2108-2112

[10] XPS STUDY OF THE CHEMICAL-STRUCTURE OF THE NICKEL-SILICON INTERFACE [J].

GRUNTHANER, PJ ;

GRUNTHANER, FJ ;

MAYER, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (05) :924-929

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