GAAS(100) SUBSTRATE CLEANING BY THERMAL ANNEALING IN HYDROGEN

被引:17
作者
BERNSTEIN, RW [1 ]
GREPSTAD, JK [1 ]
机构
[1] ELAB,N-7034 TRONDHEIM,NORWAY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期
关键词
D O I
10.1116/1.575893
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:581 / 584
页数:4
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