LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION OF BORON DOPED SILICON FILMS

被引：20

作者：

HALL, LH ^{[1
]}

KOLIWAD, KM ^{[1
]}

机构：

[1] TEXAS INSTR INC,DALLAS,TX 75222

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1973年 / 120卷 / 10期

关键词：

D O I：

10.1149/1.2403279

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：1438 / 1440

页数：3

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