LIMITS OF ACCEPTOR IMPURITY DOPING IN WIDE-BAND GAP II-VI SEMICONDUCTORS

被引:26
作者
MARFAING, Y
机构
[1] Laboratoire de Physique des Solides, Bellevue CNRS, F-92195 Meudon Cedex
关键词
D O I
10.1016/0022-0248(94)90826-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The limits of acceptor doping in wide band gap semiconductors are examined by considering the case of nitrogen-doped ZnSe. Starting from experimental observations on defect generation associated with N doping, it is shown how self-compensation due to impurity-defect pairs leads to a saturation of the free carrier concentration, in agreement with published electrical measurements. At high doping level, the statistical fluctuations in local impurity and compensating centre concentrations produce a random distribution of potential wells and hills in the semiconductor. An expression of the effective free carrier concentration above the mobility edge is obtained which predicts a sharp drop of the electrical conductivity with increasing impurity content.
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页码:305 / 309
页数:5
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