A COMPARISON OF MEASUREMENT TECHNIQUES FOR DETERMINING PHOSPHORUS DENSITIES IN SEMICONDUCTOR SILICON

被引：7

作者：

THURBER, WR

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1980年 / 9卷 / 03期

关键词：

D O I：

10.1007/BF02652935

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：551 / 560

页数：10

共 16 条

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[8] PHOTOMETRIC DETERMINATION OF TRACES OF BORON IN SILICON - AFTER SEPARATION BY A HYDROTHERMAL REFINING TECHNIQUE [J].

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