REAL-TIME AND SPECTROSCOPIC ELLIPSOMETRY OF FILM GROWTH - APPLICATION TO MULTILAYER SYSTEMS IN PLASMA AND CVD PROCESSING OF SEMICONDUCTORS

被引:34
作者
THEETEN, JB [1 ]
机构
[1] LAB PHYS APPL 3,F-94450 LIMEIL,FRANCE
关键词
D O I
10.1016/0039-6028(80)90307-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
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页码:275 / 293
页数:19
相关论文
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