HIGH-SENSITIVITY COMPOSITE POLY-(METHYL METHACRYLATE) RESIST

被引：4

作者：

HORWITZ, CM

机构：

来源：

APPLIED PHYSICS LETTERS | 1978年 / 32卷 / 12期

关键词：

D O I：

10.1063/1.89937

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：803 / 805

页数：3

共 12 条

[1] MASKING OF DEPOSITED THIN-FILMS BY MEANS OF AN ALUMINUM-PHOTORESIST COMPOSITE [J].

GREBE, K ;

AMES, I ;

GINZBERG, A .

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[2] TIME EVOLUTION OF DEVELOPED CONTOURS IN POLY-(METHYL METHACRYLATE) ELECTRON RESIST [J].

GREENEICH, JS .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (12) :5264-5268

[3] HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE [J].

HALLER, I ;

HATZAKIS, M ;

SRINIVASAN, R .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1968, 12 (03) :251-+

[4] RECENT DEVELOPMENTS IN ELECTRON-RESIST EVALUATION TECHNIQUES [J].

HATZAKIS, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1276-1279

[5]

HATZAKIS M, 1971, 11TH S EL ION LAS BE, P337

[6] MONTE-CARLO SIMULATION OF SPATIALLY DISTRIBUTED BEAMS IN ELECTRON-BEAM LITHOGRAPHY [J].

KYSER, DF ;

VISWANATHAN, NS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1305-1308

[7] DEEP UV LITHOGRAPHY [J].

LIN, BJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06) :1317-1320

[8] FABRICATION TECHNIQUES FOR SURFACE-ACOUSTIC-WAVE AND THIN-FILM OPTICAL DEVICES [J].

SMITH, HI .

PROCEEDINGS OF THE IEEE, 1974, 62 (10) :1361-1387

[9] X-RAY LITHOGRAPHY - COMPLEMENTARY TECHNIQUE TO ELECTRON-BEAM LITHOGRAPHY [J].

SMITH, HI ;

SPEARS, DL ;

BERNACKI, SE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (06) :913-917

[10] A THIN-FILM FIELD-EMISSION CATHODE [J].

SPINDT, CA .

JOURNAL OF APPLIED PHYSICS, 1968, 39 (07) :3504-&

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