INSITU INVESTIGATION OF THE GROWTH OF MICROCRYSTALLINE SILICON OBTAINED BY ALTERNATING DEPOSITION AND HYDROGEN-ETCHING SEQUENCES

被引：21

作者：

FANG, M

CHEVRIER, JB

DREVILLON, B

机构：

[1] Laboratoire de Physique des Interfaces et des Couches Minces (UPR 258 du CNRS), Ecole Polytechnique

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷

关键词：

D O I：

10.1016/S0022-3093(05)80239-X

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The growth of mu-c-Si prepared by alternating layer deposition (in growth conditions of a-Si:H) and hydrogen plasma exposure is studied by in situ spectroellipsometry. The deposition and etching sequences are clearly identified in the real time trajectories. More generally the influence of the etching by the hydrogen plasma is emphasized, in contrast with previous results.

引用

收藏

页码：791 / 794

页数：4

相关论文

共 15 条

[1] IMPROVEMENTS OF PHASE-MODULATED ELLIPSOMETRY [J].

ACHER, O ;

BIGAN, E ;

DREVILLON, B .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (01) :65-77

[2] EFFECTS OF HYDROGEN-ATOMS ON THE NETWORK STRUCTURE OF HYDROGENATED AMORPHOUS AND MICROCRYSTALLINE SILICON THIN-FILMS [J].

ASANO, A .

APPLIED PHYSICS LETTERS, 1990, 56 (06) :533-535

[3]

BLAYO N, 1991, J NONCRYSTALLINE SOL, V137

[4] INSITU SPECTROELLIPSOMETRIC STUDY OF THE NUCLEATION AND GROWTH OF AMORPHOUS-SILICON [J].

CANILLAS, A ;

BERTRAN, E ;

ANDUJAR, JL ;

DREVILLON, B .

JOURNAL OF APPLIED PHYSICS, 1990, 68 (06) :2752-2759

[5] INSITU STUDIES OF THE GROWTH OF HYDROGENATED AMORPHOUS-SILICON [J].

DREVILLON, B .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1989, 114 :139-144

[6] FAST POLARIZATION MODULATED ELLIPSOMETER USING A MICROPROCESSOR SYSTEM FOR DIGITAL FOURIER-ANALYSIS [J].

DREVILLON, B ;

PERRIN, J ;

MARBOT, R ;

VIOLET, A ;

DALBY, JL .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1982, 53 (07) :969-977

[7]

FANG M, IN PRESS

[8]

FANG M, IN PRESS J APPL PHYS

[9]

Fritzsche, 1989, ADV AMORPHOUS SEMICO, P1003

[10] KINETIC ELLIPSOMETRY STUDY OF THE HYDROGEN PLASMA-ETCHING OF HYDROGENATED AMORPHOUS-SILICON FILMS [J].

GODET, C ;

DREVILLON, B .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04) :2482-2489