INSITU MEASUREMENT AND ANALYSIS OF PLASMA-GROWN GAAS OXIDES WITH SPECTROSCOPIC ELLIPSOMETRY

被引：22

作者：

THEETEN, JB ^{[1
]}

CHANG, RPH ^{[1
]}

ASPNES, DE ^{[1
]}

ADAMS, TE ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1980年 / 127卷 / 02期

关键词：

D O I：

10.1149/1.2129675

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：378 / 385

页数：8

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