HIGH-FREQUENCY SPACE-CHARGE LAYER CAPACITANCE OF STRONGLY INVERTED SEMICONDUCTOR SURFACES

被引:29
作者
MCNUTT, MJ
SAH, CT
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
[2] UNIV ILLINOIS,DEPT ELECT ENGN,URBANA,IL 61801
关键词
D O I
10.1016/0038-1101(74)90129-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:377 / 385
页数:9
相关论文
共 23 条
[1]  
BERMAN AL, IN PRESS
[3]   TRANSPORT PROPERTIES OF ELECTRONS IN INVERTED SILICON SURFACES [J].
FANG, FF ;
FOWLER, AB .
PHYSICAL REVIEW, 1968, 169 (03) :619-+
[4]  
FOLANI F, 1967, SOLID ST ELECTRON, V10, P9
[6]   SIMPLE PHYSICAL MODEL FOR SPACE-CHARGE CAPACITANCE OF METAL-OXIDE-SEMICONDUCTOR STRUCTURES [J].
GROVE, AS ;
SAH, CT ;
SNOW, EH ;
DEAL, BE .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (08) :2458-&
[7]   MATRIX ANALYSIS OF DISTRIBUTED SEMICONDUCTOR CIRCUIT MODELS [J].
HENNIG, F ;
SAH, CT .
SOLID-STATE ELECTRONICS, 1973, 16 (09) :1081-1083
[8]   FIELD EFFECT-CAPACITANCE ANALYSIS OF SURFACE STATES ON SILICON [J].
LEHOVEC, K ;
SLOBODSKOY, A ;
SPRAGUE, JL .
PHYSICA STATUS SOLIDI, 1963, 3 (03) :447-464
[9]   SEMICONDUCTOR SURFACE VARACTOR [J].
LINDNER, R .
BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (03) :803-+