DEVELOPMENT OF COAXIAL ECR PLASMA SOURCE FOR TUBE INNER COATING

被引:14
作者
SHIGEMIZU, T
OHNO, N
FUJIYAMA, H
机构
[1] Faculty of Engineering, Nagasaki University, Nagasaki, 852
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 1991年 / 139卷
关键词
D O I
10.1016/0921-5093(91)90635-Z
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We developed an electron cyclotron resonance (ECR) plasma source with a coaxial microwave mode which has no cut-off length for coating inside a metallic tube of small diameter and shorter than the cut-off length for the microwaves used. In a discharge with a narrow gap less than the wavelength of the microwaves, both the magnetic field and the electron loss to the boundary play an important role in the condition for breakdown. We theoretically and experimentally investigated the gaseous breakdown conditions for microwave power in the presence of an external crossed magnetic field. Using a new calculation method to treat the effects of electron collisions in a wide range of gas pressures the result indicates that the ECR condition (omega = omega-ce where omega is the microwave frequency and omega-ce is the electron cyclotron frequency) has significant advantages for such a narrow-gap microwave discharge. The plasma is found to be produced at B of around 875 Gauss for the pressure range from 1 x 10(-4) to 5 x 10(-3) Torr. The discharge area broadened with increasing gas pressure. Good agreement is found between the calculated and measured discharge area. The typical electron density n(e) and electron temperature T(e) were also measured to be 8 x 10(10) cm-3 and 10 eV, respectively, which parameters are suitable for reactive sputtering or plasma chemical vapour deposition.
引用
收藏
页码:312 / 318
页数:7
相关论文
共 13 条
[1]  
BROWN SC, 1967, BASIC DATA PLASMA PH, P794
[2]  
Hayashi Y., 1985, T IEE JPN A, V105, P605
[3]  
IKEZAWA S, 1987, P INT C PHENOMENA IO, P794
[4]  
KOCH A, 1989, 9TH P INT S PLASM CH, P1820
[5]   THE EFFECT OF MAGNETIC FIELD ON THE BREAKDOWN OF GASES AT MICROWAVE FREQUENCIES [J].
LAX, B ;
ALLIS, WP ;
BROWN, SC .
JOURNAL OF APPLIED PHYSICS, 1950, 21 (12) :1297-1304
[6]   LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
MATSUO, S ;
KIUCHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L210-L212
[7]   REACTIVE ION-BEAM ETCHING USING A BROAD BEAM ECR ION-SOURCE [J].
MATSUO, S ;
ADACHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (01) :L4-L6
[8]   LOW-ENERGY ION EXTRACTION WITH SMALL DISPERSION FROM AN ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA STREAM [J].
MATSUOKA, M ;
ONO, K .
APPLIED PHYSICS LETTERS, 1987, 50 (26) :1864-1866
[9]   ELECTRON-CYCLOTRON RESONANCE PLASMA DEPOSITION TECHNIQUE USING RAW-MATERIAL SUPPLY BY SPUTTERING [J].
ONO, T ;
TAKAHASHI, C ;
MATSUO, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (08) :L534-L536
[10]   MICROWAVE ION-SOURCE [J].
SAKUDO, N ;
TOKIGUCHI, K ;
KOIKE, H ;
KANOMATA, I .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1977, 48 (07) :762-766