TRANSPORT IN REFRACTORY-METALS AND THEIR INTERACTION WITH SIO2-COMPARISON OF TUNGSTEN AND MOLYBDENUM

被引：8

作者：

KRUSINELBAUM, L

ABOELFOTOH, MO

LIN, T

AHN, KY

机构：

[1] IBM, Yorktown Heights, NY, USA, IBM, Yorktown Heights, NY, USA

来源：

THIN SOLID FILMS | 1987年 / 153卷

关键词：

D O I：

10.1016/0040-6090(87)90195-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：349 / 358

页数：10

共 16 条

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