CONDUCTANCE TECHNIQUE IN MOSFETS - STUDY OF INTERFACE TRAP PROPERTIES IN THE DEPLETION AND WEAK INVERSION REGIMES

被引:67
作者
HADDARA, HS [1 ]
ELSAYED, M [1 ]
机构
[1] UNIV ALEXANDRIA, FAC ENGN, DEPT ELECT ENGN, ALEXANDRIA, EGYPT
关键词
D O I
10.1016/0038-1101(88)90428-5
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
SEMICONDUCTOR DEVICES, MOSFET
引用
收藏
页码:1289 / 1298
页数:10
相关论文
共 15 条
[1]   SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES [J].
BERGLUND, CN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (10) :701-+
[2]   CARRIER-DENSITY FLUCTUATIONS AND IGFET MOBILITY NEAR THRESHOLD [J].
BREWS, JR .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (05) :2193-2203
[3]   A NEW AC TECHNIQUE FOR ACCURATE DETERMINATION OF CHANNEL CHARGE AND MOBILITY IN VERY THIN GATE MOSFETS [J].
CHOW, PMD ;
WANG, KL .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (09) :1299-1304
[4]   A RELIABLE APPROACH TO CHARGE-PUMPING MEASUREMENTS IN MOS-TRANSISTORS [J].
GROESENEKEN, G ;
MAES, HE ;
BELTRAN, N ;
DEKEERSMAECKER, RF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1984, 31 (01) :42-53
[5]   PROFILING OF STRESS-INDUCED INTERFACE STATES IN SHORT CHANNEL MOSFETS USING A COMPOSITE CHARGE PUMPING TECHNIQUE [J].
HADDARA, H ;
CRISTOLOVEANU, S .
SOLID-STATE ELECTRONICS, 1986, 29 (08) :767-772
[6]   INVESTIGATION OF MOST CHANNEL CONDUCTANCE IN WEAK INVERSION [J].
KOOMEN, J .
SOLID-STATE ELECTRONICS, 1973, 16 (07) :801-810
[7]   A QUASI-STATIC TECHNIQUE FOR MOS C-V AND SURFACE STATE MEASUREMENTS [J].
KUHN, M .
SOLID-STATE ELECTRONICS, 1970, 13 (06) :873-+
[8]   SI-SIO2 INTERFACE - ELECTRICAL PROPERTIES AS DETERMINED BY METAL-INSULATOR-SILICON CONDUCTANCE TECHNIQUE [J].
NICOLLIA.EH ;
GOETZBER.A .
BELL SYSTEM TECHNICAL JOURNAL, 1967, 46 (06) :1055-+
[9]  
NICOLLIAN EH, 1982, MOS PHYSICS TECHNOLO