ATOMIC LAYER EPITAXY GROWTH OF DOPED ZINC-OXIDE THIN-FILMS FROM ORGANOMETALS

被引:174
作者
LUJALA, V
SKARP, J
TAMMENMAA, M
SUNTOLA, T
机构
[1] Microchemistry Ltd., FIN-02151 Espoo
关键词
D O I
10.1016/0169-4332(94)90192-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
An atomic layer epitaxy process for growing Al-doped ZnO thin films is presented. Organometallic precursors of zinc and aluminum were used to react with water at substrate temperatures of 120-350-degrees-C. Growth rate varied from 0.5 to 2.5 angstrom/cycle, depending on precursors and substrate temperatures used. With optimum doping, sheet resistances of 10 OMEGA/DELTA with 1 mum thick films were obtained.
引用
收藏
页码:34 / 40
页数:7
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