STRUCTURE AND PROPERTIES OF REFRACTORY COMPOUNDS DEPOSITED BY ELECTRON-BEAM EVAPORATION

被引：36

作者：

BUNSHAH, RF ^{[1
]}

NIMMAGADDA, R ^{[1
]}

DUNFORD, W ^{[1
]}

MOVCHAN, BA ^{[1
]}

DEMCHISHIN, AV ^{[1
]}

CHURSANOV, NA ^{[1
]}

机构：

[1] EO PATON WELDING INST,KIEV,UKSSR

来源：

THIN SOLID FILMS | 1978年 / 54卷 / 01期

关键词：

D O I：

10.1016/0040-6090(78)90280-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：85 / 106

页数：22

共 20 条

[1]

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BUNSHAH, RF ;

SCHRAMM, RJ ;

NIMMAGADDA, R ;

MOVCHAN, BA ;

BORODIN, VP .

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[3] ACTIVATED REACTIVE EVAPORATION PROCESS FOR HIGH RATE DEPOSITION OF COMPOUNDS [J].

BUNSHAH, RF ;

RAGHURAM, AC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (06) :1385-&

[4]

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[5] SYNTHESIS OF VARIOUS OXIDES IN TI-O SYSTEM BY REACTIVE EVAPORATION AND ACTIVATED REACTIVE EVAPORATION TECHNIQUES [J].

GROSSKLAUS, W ;

BUNSHAH, RF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :593-597

[6] EFFECT OF SUBSTRATE POTENTIAL ON AL2O3 FILMS PREPARED BY ELECTRON-BEAM EVAPORATION [J].

HOFFMAN, D ;

LEIBOWIT.D .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :326-&

[7]

KAUFMAN L, 1977, SEP P INT C EL PAT W

[8]

Movchan B. A., 1969, Fizika Metallov i Metallovedenie, V28, P653

[9]

MOVCHAN BA, 1978, PATON WELDING I J

[10]

MOVCHAN BA, 1975, COMMUNICATION

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