PHOTOELECTRIC PROPERTIES OF OXYGEN-DOPED A-SI-H PREPARED BY RF-SPUTTERING

被引:8
作者
JIRANAPAKUL, K
SHIRAKAWA, K
SHIRAFUJI, J
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 10期
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D O I
10.1143/JJAP.25.1457
中图分类号
O59 [应用物理学];
学科分类号
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页码:1457 / 1464
页数:8
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