HEAVY DOPING EFFECTS IN P-N-P BIPOLAR-TRANSISTORS

被引:100
作者
TANG, DD
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D O I
10.1109/T-ED.1980.19899
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:563 / 570
页数:8
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共 30 条
[1]   NEW MODEL FOR BORON-DIFFUSION IN SILICON [J].
ANDERSON, JR ;
GIBBONS, JF .
APPLIED PHYSICS LETTERS, 1976, 28 (04) :184-186
[2]  
BAHANAN D, 1969, IEEE T ELECTRON DEVI, V16, P117
[3]   INFRARED ABSORPTION IN HEAVILY DOPED N-TYPE SI [J].
BALKANSKI, M ;
AZIZA, A ;
AMZALLAG, E .
PHYSICA STATUS SOLIDI, 1969, 31 (01) :323-+
[4]   CARRIER MOBILITIES IN SILICON EMPIRICALLY RELATED TO DOPING AND FIELD [J].
CAUGHEY, DM ;
THOMAS, RE .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1967, 55 (12) :2192-+
[5]   COMPARISON OF EXPERIMENTAL AND THEORETICAL CARRIER CONCENTRATIONS IN HEAVILY DOPED N-TYPE SILICON [J].
FINETTI, M ;
MAZZONE, AM ;
PASSARI, L ;
PIETRA, S ;
SUSI, E .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (10) :4590-4592
[6]  
FISTUL VI, 1969, HEAVILY DOPED SEMICO, P132
[7]   EVALUATION OF ELECTRON INJECTION CURRENT-DENSITY IN P-LAYERS FOR INJECTION MODELING OF I2L [J].
HEIMEIER, HH ;
BERGER, HH .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1977, 12 (02) :205-206
[8]   LIMITATIONS IN MICROELECTRONICS .2. BIPOLAR TECHNOLOGY [J].
HOENEISEN, B ;
MEAD, CA .
SOLID-STATE ELECTRONICS, 1972, 15 (08) :891-+
[9]   RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].
IRVIN, JC .
BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02) :387-+
[10]   THOMAS-FERMI APPROACH TO IMPURE SEMICONDUCTOR BAND STRUCTURE [J].
KANE, EO .
PHYSICAL REVIEW, 1963, 131 (01) :79-&