NEW FLANGE CORRECTION FORMULA APPLIED TO INTERFACIAL RESISTANCE MEASUREMENTS OF OHMIC CONTACTS TO GAAS

被引：5

作者：

LIENEWEG, U

HANNAMAN, DJ

机构：

来源：

IEEE ELECTRON DEVICE LETTERS | 1987年 / 8卷 / 05期

关键词：

D O I：

10.1109/EDL.1987.26603

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：202 / 204

页数：3

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