DIRECT MEASUREMENTS OF INTERFACIAL CONTACT RESISTANCE, END CONTACT RESISTANCE, AND INTERFACIAL CONTACT LAYER UNIFORMITY

被引：144

作者：

PROCTOR, SJ ^{[1
]}

LINHOLM, LW ^{[1
]}

MAZER, JA ^{[1
]}

机构：

[1] NBS, DIV SEMICOND DEVICES & CIRCUITS, WASHINGTON, DC USA

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1983年 / 30卷 / 11期

关键词：

D O I：

10.1109/T-ED.1983.21334

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1535 / 1542

页数：8

共 24 条

[1] MICROSTRUCTURAL AND ELECTRICAL PROPERTIES OF THIN PTSI FILMS AND THEIR RELATIONSHIPS TO DEPOSITION PARAMETERS [J].

ANDERSON, RM ;

REITH, TM .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (10) :1337-1347

[2] CONTACT RESISTANCE AND CONTACT RESISTIVITY [J].

BERGER, HH .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (04) :507-&

[3] MODELS FOR CONTACTS TO PLANAR DEVICES [J].

BERGER, HH .

SOLID-STATE ELECTRONICS, 1972, 15 (02) :145-&

[4] BRIDGE AND VAN-DER-PAUW SHEET RESISTORS FOR CHARACTERIZING LINE-WIDTH OF CONDUCTING LAYERS [J].

BUEHLER, MG ;

GRANT, SD ;

THURBER, WR .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (04) :650-654

[5] SPECIFIC CONTACT RESISTANCE OF METAL-SEMICONDUCTOR BARRIERS [J].

CHANG, CY ;

FANG, YK ;

SZE, SM .

SOLID-STATE ELECTRONICS, 1971, 14 (07) :541-&

[6]

COHEN SS, 1982, EL SOC EXT ABS, V82, P364

[7]

DEVRIES DB, 1973, AFALTR73268 AIR FORC

[8] ALUMINUM-SILICON OHMIC CONTACT ON SHALLOW N+-P JUNCTIONS [J].

FINETTI, M ;

OSTOJA, P ;

SOLMI, S ;

SONCINI, G .

SOLID-STATE ELECTRONICS, 1980, 23 (03) :255-&

[9] METALLIZATION IN MICROELECTRONICS [J].

GHATE, PB ;

BLAIR, JC ;

FULLER, CR .

THIN SOLID FILMS, 1977, 45 (01) :69-84

[10]

GOETZBERGER A, 1964, AFALTDR64207 AIR FOR

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