THEORY FOR THE ETCHING OF ORGANIC MATERIALS BY ULTRAVIOLET-LASER PULSES

被引：102

作者：

SAUERBREY, R ^{[1
]}

PETTIT, GH ^{[1
]}

机构：

[1] RICE UNIV,RICE QUANTUM INST,HOUSTON,TX 77251

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 05期

关键词：

D O I：

10.1063/1.101884

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：421 / 423

页数：3

共 18 条

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ANDREW, JE ;

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KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

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LANKARD, JR ;

BAISE, AI ;

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KAUFMAN, J .

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[3] DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH [J].

COLE, HS ;

LIU, YS ;

PHILIPP, HR .

APPLIED PHYSICS LETTERS, 1986, 48 (01) :76-77

[4] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[5] MICROSCOPIC MODEL FOR THE ABLATIVE PHOTODECOMPOSITION OF POLYMERS BY FAR-ULTRAVIOLET RADIATION (193 NM) [J].

GARRISON, BJ ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1984, 44 (09) :849-851

[6] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J].

GORODETSKY, G ;

KAZYAKA, TG ;

MELCHER, RL ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1985, 46 (09) :828-830

[7]

KOREN G, 1987, APPL PHYS LETT, V50, P1031

[8] FEMTOSECOND UV EXCIMER LASER ABLATION [J].

KUPER, S ;

STUKE, M .

APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1987, 44 (04) :199-204

[9]

KUPER S, 1989, APPL PHYS LETT, V54, P4, DOI 10.1063/1.100831

[10] THEORY OF POLYMER ABLATION [J].

MAHAN, GD ;

COLE, HS ;

LIU, YS ;

PHILIPP, HR .

APPLIED PHYSICS LETTERS, 1988, 53 (24) :2377-2379

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