THEORY OF POLYMER ABLATION

被引：73

作者：

MAHAN, GD

COLE, HS

LIU, YS

PHILIPP, HR

机构：

[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37831

[2] GE,CTR CORP RES & DEV,SCHENECTADY,NY 12301

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 24期

关键词：

D O I：

10.1063/1.100235

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2377 / 2379

页数：3

共 17 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J].

ANDREW, JE ;

DYER, PE ;

FORSTER, D ;

KEY, PH .

APPLIED PHYSICS LETTERS, 1983, 43 (08) :717-719

[2] POLYMER FILM CUTTING AND ABLATIVE ETCHING USING A 1-KHZ XECL LASER [J].

BISHOP, GJ ;

DYER, PE .

APPLIED PHYSICS LETTERS, 1985, 47 (11) :1229-1231

[3] EXCIMER LASER ETCHING OF POLYIMIDE [J].

BRANNON, JH ;

LANKARD, JR ;

BAISE, AI ;

BURNS, F ;

KAUFMAN, J .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) :2036-2043

[4] DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH [J].

COLE, HS ;

LIU, YS ;

PHILIPP, HR .

APPLIED PHYSICS LETTERS, 1986, 48 (01) :76-77

[5] SELF-DEVELOPING UV PHOTORESIST USING EXCIMER LASER EXPOSURE [J].

DEUTSCH, TF ;

GEIS, MW .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (12) :7201-7204

[6] EXCIMER LASER ABLATION AND THERMAL COUPLING EFFICIENCY TO POLYMER-FILMS [J].

DYER, PE ;

SIDHU, J .

JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) :1420-1422

[7] CALORIMETRIC AND ACOUSTIC STUDY OF ULTRAVIOLET-LASER ABLATION OF POLYMERS [J].

GORODETSKY, G ;

KAZYAKA, TG ;

MELCHER, RL ;

SRINIVASAN, R .

APPLIED PHYSICS LETTERS, 1985, 46 (09) :828-830

[8]

JELLINEK HHG, 1984, J PHYS CHEM-US, V88, P3048, DOI 10.1021/j150658a024

[9] EFFECTIVE DEEP ULTRAVIOLET PHOTOETCHING OF POLY(METHYL METHACRYLATE BY AN EXCIMER LASER [J].

KAWAMURA, Y ;

TOYODA, K ;

NAMBA, S .

APPLIED PHYSICS LETTERS, 1982, 40 (05) :374-375

[10] THEORY OF PHOTOABLATION AND ITS IMPLICATIONS FOR LASER PHOTOTHERAPY [J].

KEYES, T ;

CLARKE, RH ;

ISNER, JM .

JOURNAL OF PHYSICAL CHEMISTRY, 1985, 89 (20) :4194-4196

← 1 2 →