VACANCY KINETICS AND SPUTTERING OF GAAS(110)

被引:27
作者
PECHMAN, RJ
WANG, XS
WEAVER, JH
机构
[1] Department of Materials Science and Chemical Engineering, University of Minnesota, Minneapolis
来源
PHYSICAL REVIEW B | 1995年 / 51卷 / 16期
关键词
D O I
10.1103/PhysRevB.51.10929
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Bombardment of GaAs(110) at 300≤T≤775 K with Ar+ ions at normal incidence creates surface-layer defects that generally span one or two unit cells, as shown by scanning tunneling microscopy. Vacancies produced in this way diffuse via thermal activation to form single-layer vacancy islands. The diffusion of divacancies favors [11̄0] and accommodation at islands produces roughly isotropic islands. Modeling of growth showed an overall Arrhenius behavior for diffusion with an activation energy of 1.3±0.2 eV. Investigations of the surface morphology during multilayer erosion revealed deviation from layer-by-layer removal with scaling exponents between 0.4 and 0.5 for 626≤T≤775 K. © 1995 The American Physical Society.
引用
收藏
页码:10929 / 10936
页数:8
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