X-RAY PHOTOELECTRON-SPECTROSCOPY SURFACE-CHARGE BUILDUP USED TO STUDY RESIDUE IN DEEP FEATURES ON INTEGRATED-CIRCUITS

被引：9

作者：

THOMAS, JH

BRYSON, CE

PAMPALONE, TR

机构：

[1] KEVEX CORP,GLENN T SEABORG LAB,FOSTER CITY,CA 94404

[2] RCA CORP,CTR MICROELECTR,SOMERVILLE,NJ 08876

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575649

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1097 / 1098

页数：2

共 10 条

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[9] PREPARATION OF SUBSTRATES FOR FILM DEPOSITION USING GLOW-DISCHARGE TECHNIQUES
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[10] A SYSTEM FOR INSITU STUDIES OF PLASMA SURFACE INTERACTIONS USING X-RAY PHOTOELECTRON-SPECTROSCOPY
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (03): : 1452 - 1455

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