MECHANISMS FOR SUCCESS OR FAILURE OF DIFFUSION-BARRIERS BETWEEN ALUMINUM AND SILICON

被引：35

作者：

HARPER, JME

HORNSTROM, SE

THOMAS, O

CHARAI, A

KRUSINELBAUM, L

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575814

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：875 / 880

页数：6

共 31 条

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