BASIC STUDIES OF GALLIUM NITRIDE GROWTH ON SAPPHIRE BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION AND OPTICAL-PROPERTIES OF DEPOSITED LAYERS

We have studied the growth of gallium nitride on c-plane sapphire substrates. The layers were grown in a horizontal metalorganic chemical vapor deposition reactor at atmospheric pressure using trimethylgallium (TMG) and ammonia (NH3). Variation of the V/III ratio (150-2500) shows a distinct effect on the growth rate. With decreasing V/III ratio, we find an increasing growth rate. Variation of the growth temperature (700-1000 degrees C) shows a weak increase in growth rate with temperature. Furthermore, we performed secondary ion mass spectroscopy measurements and find an increasing carbon incorporation in the GaN films with decreasing ammonia partial, pressure and a growing accumulation of carbon at the substrate interface. Photoluminescence measurements show that samples with high carbon content show a strong yellow luminescence peaking at 2.2 eV and a near band gap emission at 3.31 eV. With increasing carbon content, the intensity of the 3.31 eV line increases suggesting that a carbon related center is involved.